Effect of NH3/N2 ratio in plasma treatment on porous low dielectric constant SiCOH materials
Crossref DOI link: https://doi.org/10.1116/1.4868631
Published Online: 2014-03-20
Published Print: 2014-05-01
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Huang, Jun-Fu
Bo, Tain-Cih
Chang, Wei-Yuan
Chang, Yu-Min
Leu, Jihperng
Cheng, Yi-Lung
