Optical characteristics of nanocrystalline AlxGa1−xN thin films deposited by hollow cathode plasma-assisted atomic layer deposition
Crossref DOI link: https://doi.org/10.1116/1.4870381
Published Online: 2014-04-02
Published Print: 2014-05-01
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Goldenberg, Eda
Ozgit-Akgun, Cagla
Biyikli, Necmi
Kemal Okyay, Ali
