Lift-off with solvent for negative resist using low energy electron beam exposure
Crossref DOI link: https://doi.org/10.1116/1.4901012
Published Online: 2014-11-06
Published Print: 2014-11-01
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Dey, Ripon Kumar
Cui, Bo
