Determination and analysis of minimum dose for achieving vertical sidewall in electron-beam lithography
Crossref DOI link: https://doi.org/10.1116/1.4901013
Published Online: 2014-11-06
Published Print: 2014-11-01
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Zhao, Xinyu
Dai, Qing
Lee, Soo-Young
Choi, Jin
Lee, Sang-Hee
Shin, In-Kyun
Jeon, Chan-Uk
