Crossmark

Study on the internal field and conduction mechanism of atomic layer deposited ferroelectric Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub> thin films

Crossref DOI link: https://doi.org/10.1039/C5TC01074H

Published Online: 2015

Update policy: https://doi.org/10.1039/rsc_crossmark_policy

Authors

Park, M. H.

Kim, H. J.

Kim, Y. J.

Moon, T.

Kim, K. D.

Lee, Y. H.

Hyun, S. D.

Hwang, C. S.
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: This document is Similarity Check deposited

COPYRIGHT AND LICENSING

: The Royal Society of Chemistry has an exclusive publication licence for this journal

PEER REVIEW METHOD

: Single-blind

PUBLICATION HISTORY

: Received 16 April 2015; Accepted 20 May 2015; Accepted Manuscript published 21 May 2015; Advance Article published 29 May 2015; Version of Record published 11 June 2015