Etch characteristics of magnetic tunnel junction materials using substrate heating in the pulse-biased inductively coupled plasma
Crossref DOI link: https://doi.org/10.1116/1.4929466
Published Online: 2015-08-26
Published Print: 2015-11-01
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Jeon, Min Hwan
Yang, Kyung Chae
Lee, Sehan
Yeom, Geun Young
