Elementary surface processes during reactive magnetron sputtering of chromium
Crossref DOI link: https://doi.org/10.1063/1.4932150
Published Online: 2015-10-02
Published Print: 2015-10-07
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Monje, Sascha
Corbella, Carles
von Keudell, Achim
Funding for this research was provided by:
Deutsche Forschungsgemeinschaft (SFB-TR 87)
