Electron beam lithography using a PMMA/P(MMA 8.5 MAA) bilayer for negative tone lift-off process
Crossref DOI link: https://doi.org/10.1116/1.4935129
Published Online: 2015-11-09
Published Print: 2015-11-01
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Blanchard-Dionne, Andre-Pierre
Meunier, Michel
Funding for this research was provided by:
Natural Sciences and Engineering Research Council of Canada
