CMOS compatible electrode materials selection in oxide-based memory devices
Crossref DOI link: https://doi.org/10.1063/1.4955044
Published Online: 2016-07-13
Published Print: 2016-07-14
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Zhuo, V. Y.-Q. https://orcid.org/0000-0002-5718-2170
Li, M.
Guo, Y.
Wang, W.
Yang, Y.
Jiang, Y. https://orcid.org/0000-0001-6657-7126
Robertson, J.
