A high power impulse magnetron sputtering model to explain high deposition rate magnetic field configurations
Crossref DOI link: https://doi.org/10.1063/1.4965875
Published Online: 2016-10-24
Published Print: 2016-10-28
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Raman, Priya
Weberski, Justin https://orcid.org/0000-0002-5626-7914
Cheng, Matthew
Shchelkanov, Ivan
Ruzic, David N.
Funding for this research was provided by:
National Science Foundation (15-40030)
