Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
Crossref DOI link: https://doi.org/10.1116/1.4965966
Published Online: 2016-10-25
Published Print: 2017-01-01
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Vallat, Rémi
Gassilloud, Rémy
Eychenne, Brice
Vallée, Christophe
Funding for this research was provided by:
Agence Nationale de la Recherche (ANR-10-IQPX-33)
Seventh Framework Programme (621217)
