Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma
Crossref DOI link: https://doi.org/10.1116/1.4972210
Published Online: 2016-12-20
Published Print: 2017-01-01
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Sharma, Akhil
Longo, Valentino
Verheijen, Marcel A.
Bol, Ageeth A.
Kessels, W. M. M. (Erwin)
Funding for this research was provided by:
Nederlandse Organisatie voor Wetenschappelijk Onderzoek (578467)
