Effects of ultraviolet and vacuum ultraviolet synchrotron radiation on organic underlayers to modulate line-edge roughness of fine-pitch poly-silicon patterns
Crossref DOI link: https://doi.org/10.1116/1.4985541
Published Online: 2017-06-13
Published Print: 2017-09-01
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Miyazoe, Hiroyuki
Engelmann, Sebastian U.
Guillorn, Michael A.
Pei, Dongfei
Li, Weiyi
Lauer, Jason L.
Leon Shohet, J.
Fuller, Nicholas C. M.
Funding for this research was provided by:
National Science Foundation (CBET-1966231)
Semiconductor Research Corporation (2012-KJ-2349)
