Role of the dense amorphous carbon layer in photoresist etching
Crossref DOI link: https://doi.org/10.1116/1.5009640
Published Online: 2017-12-19
Published Print: 2018-03-01
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Pranda, Adam
Gutierrez Razo, Sandra A.
Tomova, Zuleykhan
Fourkas, John T.
Oehrlein, Gottlieb S.
Funding for this research was provided by:
National Science Foundation (CMMI-1449309)
U.S. Department of Energy (DE-SC0001939)
