Band alignment of atomic layer deposited SiO2 on (010) (Al0.14Ga0.86)2O3
Crossref DOI link: https://doi.org/10.1116/1.5052620
Published Online: 2018-10-30
Published Print: 2018-11-01
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Fares, Chaker
Ren, F.
Lambers, Eric
Hays, David C.
Gila, B. P.
Pearton, S. J.
Funding for this research was provided by:
Defense Threat Reduction Agency (HDTRA1-17-1-011)
Accepted Manuscript valid from 2019-10-30
