Increasing etching depth of sapphire nanostructures using multilayer etching mask
Crossref DOI link: https://doi.org/10.1116/1.5119388
Published Online: 2019-10-30
Published Print: 2019-11-01
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Chen, Yi-An https://orcid.org/0000-0002-9843-2498
Chen, I-Te
Chang, Chih-Hao https://orcid.org/0000-0003-4268-4108
Funding for this research was provided by:
National Science Foundation (CMMI#1552424)
Army Research Office (W911NF-17- 1-0591)
Accepted Manuscript valid from 2020-10-30
