Thermal etching of AlF3 and thermal atomic layer etching of Al2O3
Crossref DOI link: https://doi.org/10.1116/1.5135911
Published Online: 2020-01-14
Published Print: 2020-03-01
Update policy: https://doi.org/10.1063/aip-crossmark-policy-page
Fischer, Andreas
Routzahn, Aaron
Lee, Younghee
Lill, Thorsten
George, Steven M. https://orcid.org/0000-0003-0253-9184
