Crossmark

Plasma etching of wide bandgap and ultrawide bandgap semiconductors

Crossref DOI link: https://doi.org/10.1116/1.5131343

Published Online: 2020-01-16

Published Print: 2020-03-01

Update policy: https://doi.org/10.1063/aip-crossmark-policy-page

Authors

Pearton, Stephen J. https://orcid.org/0000-0001-6498-1256
Douglas, Erica A. https://orcid.org/0000-0003-1873-0223
Shul, Randy J.

Ren, Fan https://orcid.org/0000-0001-9234-019X
Funding

Funding for this research was provided by:

National Science Foundation (DMR 1856662)

Defense Threat Reduction Agency (HDTRA1-17-1-011)

Sandia National Laboratories (DE-NA-0003525)