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Effects of C4F8 plasma polymerization film on etching profiles in the Bosch process

Crossref DOI link: https://doi.org/10.1116/5.0158954

Published Online: 2023-10-02

Published Print: 2023-12-01

Update policy: https://doi.org/10.1063/aip-crossmark-policy-page

Authors

Nonaka, Tomoyuki https://orcid.org/0009-0006-7278-1397
Takahashi, Kazuo https://orcid.org/0000-0003-1223-1263
Uchida, Akimi https://orcid.org/0009-0005-4039-9057
Lundgaard, Stefan https://orcid.org/0000-0003-2463-8562
Tsuji, Osamu https://orcid.org/0009-0002-1068-850X