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The effect of increasing V content on the structure, mechanical properties and oxidation resistance of Ti–Si–V–N films deposited by DC reactive magnetron sputtering

Crossref DOI link: https://doi.org/10.1016/j.apsusc.2013.10.117

Published Print: 2014-01

Update policy: https://doi.org/10.1016/elsevier_cm_policy

Authors

Fernandes, F.

Loureiro, A.

Polcar, T.

Cavaleiro, A.
Funding

Funding for this research was provided by:

FEDER

FCT – Fundação para a Ciência e a Tecnologia (PEst-C/EME/UI0285/2013)

FCT – Fundação para a Ciência e a Tecnologia (CENTRO-07-0224-FEDER-002001)

FCT – Fundação para a Ciência e a Tecnologia (Mais Centro SCT_2011_02_001_4637)

FCT – Fundação para a Ciência e a Tecnologia (PTDC/EME-TME/122116/2010)

FCT – Fundação para a Ciência e a Tecnologia (Plungetec)

FCT – Fundação para a Ciência e a Tecnologia (SFRH/BD/68740/2010)
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Article Title: The effect of increasing V content on the structure, mechanical properties and oxidation resistance of Ti–Si–V–N films deposited by DC reactive magnetron sputtering

Journal Title: Applied Surface Science

CrossRef DOI link to publisher maintained version: https://doi.org/10.1016/j.apsusc.2013.10.117

Content Type: article

Copyright: Copyright © 2013 Elsevier B.V. All rights reserved.

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