Ding, Yangyao
Zhang, Yichi
Orkoulas, Gerassimos
Christofides, Panagiotis D.
Funding for this research was provided by:
National Science Foundation
This article is maintained by: Elsevier
Article Title: Microscopic modeling and optimal operation of plasma enhanced atomic layer deposition
Journal Title: Chemical Engineering Research and Design
CrossRef DOI link to publisher maintained version: https://doi.org/10.1016/j.cherd.2020.05.014
Content Type: article
Copyright: © 2020 Institution of Chemical Engineers. Published by Elsevier B.V. All rights reserved.