Huo, Fangfang https://orcid.org/0009-0006-5829-5261
Muydinov, Ruslan
Seibertz, Bertwin Bilgrim Otto
Wang, Can
Hartig, Manuel
Alktash, Nivin
Gao, Peng
Szyszka, Bernd
Funding for this research was provided by:
Helmholtz-Zentrum Berlin für Materialien und Energie
National Natural Science Foundation of China
German Research Foundation (AOBJ 649257)
Technische Universität Berlin
Chinese Academy of Sciences (21975260)
This article is maintained by: Elsevier
Article Title: Tantalum-doped tin oxide thin films using hollow cathode gas flow sputtering technology
Journal Title: Heliyon
CrossRef DOI link to publisher maintained version: https://doi.org/10.1016/j.heliyon.2024.e30943
Content Type: article
Copyright: © 2024 The Authors. Published by Elsevier Ltd.