Schuller, Patrick
Rothbauer, Mario https://orcid.org/0000-0002-9928-3631
Eilenberger, Christoph
Kratz, Sebastian R.A.
Höll, Gregor
Taus, Philipp
Schinnerl, Markus
Genser, Jakob
Ertl, Peter
Wanzenboeck, Heinz
Funding for this research was provided by:
Horizon 2020
This article is maintained by: Elsevier
Article Title: Optimized plasma-assisted bi-layer photoresist fabrication protocol for high resolution microfabrication of thin-film metal electrodes on porous polymer membranes
Journal Title: MethodsX
CrossRef DOI link to publisher maintained version: https://doi.org/10.1016/j.mex.2019.10.038
Content Type: simple-article
Copyright: © 2019 The Authors. Published by Elsevier B.V.