Hsia, Feng-Chun
Elam, Fiona M.
Bonn, Daniel
Weber, Bart
Franklin, Steve E.
Funding for this research was provided by:
Advanced Research Center for Nanolithography
University of Amsterdam (UvA), the Netherlands
Vrije University Amsterdam (VU), the Netherlands
Dutch Research Council
semiconductor equipment manufacturer ASML
This article is maintained by: Elsevier
Article Title: Wear particle dynamics drive the difference between repeated and non-repeated reciprocated sliding
Journal Title: Tribology International
CrossRef DOI link to publisher maintained version: https://doi.org/10.1016/j.triboint.2019.105983
Content Type: article
Copyright: © 2019 The Authors. Published by Elsevier Ltd.