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Measurement of nc-Si:H film uniformity and diagnosis of plasma spatial structure produced by a very high frequency, differentially powered, multi-tile plasma source

Crossref DOI link: https://doi.org/10.1016/j.vacuum.2015.03.019

Published Print: 2015-09

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Authors

Monaghan, E. https://orcid.org/0000-0002-1297-0560
Yeom, G.Y.

Ellingboe, A.R.
Funding

Funding for this research was provided by:

Enterprise Ireland and the European Regional Development Fund (ERDF)

Korea Institute for the Advancement of Technology

Ministry of Knowledge Economy (L-2010-1438-000)
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Article Title: Measurement of nc-Si:H film uniformity and diagnosis of plasma spatial structure produced by a very high frequency, differentially powered, multi-tile plasma source

Journal Title: Vacuum

CrossRef DOI link to publisher maintained version: https://doi.org/10.1016/j.vacuum.2015.03.019

Content Type: article

Copyright: Copyright © 2015 Elsevier Ltd. All rights reserved.

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