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Effect of pulse phase lag in the dual synchronized pulsed capacitive coupled plasma on the etch characteristics of SiO2 by using a C4F8/Ar/O2 gas mixture

Crossref DOI link: https://doi.org/10.1016/j.vacuum.2015.05.009

Published Print: 2015-11

Update policy: https://doi.org/10.1016/elsevier_cm_policy

Authors

Jeon, Min Hwan

Yang, Kyung Chae

Kim, Kyong Nam

Yeom, Geun Young
Funding

Funding for this research was provided by:

Ministry of Knowledge Economy (10041681)

Ministry of Knowledge Economy (N009300229)
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Article Title: Effect of pulse phase lag in the dual synchronized pulsed capacitive coupled plasma on the etch characteristics of SiO2 by using a C4F8/Ar/O2 gas mixture

Journal Title: Vacuum

CrossRef DOI link to publisher maintained version: https://doi.org/10.1016/j.vacuum.2015.05.009

Content Type: article

Copyright: Copyright © 2015 Elsevier Ltd. All rights reserved.

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