Lin, Yibo
Yu, Bei
Zou, Yi
Li, Zhuo
Alpert, Charles J.
Pan, David Z.
Funding for this research was provided by:
NSF
SRC
CUHK
This article is maintained by: Elsevier
Article Title: Stitch aware detailed placement for multiple E-beam lithography
Journal Title: Integration
CrossRef DOI link to publisher maintained version: https://doi.org/10.1016/j.vlsi.2017.02.004
Content Type: article
Copyright: © 2017 Elsevier B.V. All rights reserved.