Rakhimova, T V
Lopaev, D V
Mankelevich, Yu A
Kurchikov, K A
Zyryanov, S M
Palov, A P
Proshina, O V
Maslakov, K I
Baklanov, M R
Funding for this research was provided by:
Optec (28/2014/71-Msk)
Semiconductor Research Corporation (2012-KJ-2280)
Russian Foundation for Basic Research (12-02-00536-a, 14-02-31599 mol-a)
Journal title: Journal of Physics D: Applied Physics
Article type: paper
Article title: Interaction of F atoms with SiOCH ultra low-k films. Part II: etching
Copyright information: © 2015 IOP Publishing Ltd
Publication dates
Date received: 2014-10-09
Date accepted: 2015-02-24
Online publication date: 2015-03-31