Hänninen, Tuomas
Schmidt, Susann
Wissting, Jonas
Jensen, Jens
Hultman, Lars
Högberg, Hans
Funding for this research was provided by:
Carl Tryggers Stiftelse för Vetenskaplig Forskning
Seventh Framework Programme (GA-310477)
Swedish Government Strategic Research Area in Materials Science (SFO-Mat-LiU No. 2009-00971)
Journal title: Journal of Physics D: Applied Physics
Article type: paper
Article title: Stoichiometric silicon oxynitride thin films reactively sputtered in Ar/N2O plasmas by HiPIMS
Copyright information: © 2016 IOP Publishing Ltd
Publication dates
Date received: 2015-11-18
Date accepted: 2016-02-01
Online publication date: 2016-03-01