Ohmi, Hiromasa
Funaki, Takeshi
Kakiuchi, Hiroaki
Yasutake, Kiyoshi
Journal title: Journal of Physics D: Applied Physics
Article type: paper
Article title: Efficiency of silane gas generation in high-rate silicon etching by narrow-gap microwave hydrogen plasma
Copyright information: © 2016 IOP Publishing Ltd
Publication dates
Date received: 2015-07-18
Date accepted: 2015-10-26
Online publication date: 2015-12-09