Shimizu, T
Villamayor, M
Lundin, D
Helmersson, U
Funding for this research was provided by:
Japan Society for the Promotion of Science (No. 26820327)
Bases Conversion Development Authority
Vetenskapsrådet (VR 621-2014-4882)
Amada Foundation (AF-2013028)
Journal title: Journal of Physics D: Applied Physics
Article type: paper
Article title: Process stabilization by peak current regulation in reactive high-power impulse magnetron sputtering of hafnium nitride
Copyright information: © 2016 IOP Publishing Ltd
Publication dates
Date received: 2015-08-24
Date accepted: 2015-12-21
Online publication date: 2016-01-12