Li, Liuan
Xu, Yonggang
Wang, Qingpeng
Nakamura, Ryosuke
Jiang, Ying
Ao, Jin-Ping
Journal title: Semiconductor Science and Technology
Article type: paper
Article title: Metal-oxide-semiconductor AlGaN/GaN heterostructure field-effect transistors using TiN/AlO stack gate layer deposited by reactive sputtering
Copyright information: © 2015 IOP Publishing Ltd
Publication dates
Date received: 2014-08-05
Date accepted: 2014-11-12
Online publication date: 2014-12-30