Shah, Amit P
Rahman, A Azizur
Bhattacharya, Arnab
Funding for this research was provided by:
Tata Institute of Fundamental Research (06X138, 12P0168, 12P0169)
Journal title: Semiconductor Science and Technology
Article type: paper
Article title: ICP-RIE etching of polar, semi-polar and non-polar AlN: comparison of Cl2/Ar and Cl2/BCl3/Ar plasma chemistry and surface pretreatment
Copyright information: © 2015 IOP Publishing Ltd
Publication dates
Date received: 2014-07-02
Date accepted: 2014-11-24
Online publication date: 2014-12-30