Liu, Li-Hong
Michalak, David J
Chopra, Tatiana P
Pujari, Sidharam P
Cabrera, Wilfredo
Dick, Don
Veyan, Jean-François
Hourani, Rami
Halls, Mathew D
Zuilhof, Han
Chabal, Yves J
Funding for this research was provided by:
National Science Foundation (CHE-1300180)
Semiconductor Research Corporation
Intel Corporation
Journal title: Journal of Physics: Condensed Matter
Article type: paper
Article title: Surface etching, chemical modification and characterization of silicon nitride and silicon oxide—selective functionalization of Si3N4and SiO2
Copyright information: © 2016 IOP Publishing Ltd
Publication dates
Date received: 2015-07-02
Date accepted: 2015-12-03
Online publication date: 2016-02-12