Jeon, Min Hwan
Ahn, Chisung
Kim, HyeongU
Kim, Kyong Nam
LiN, Tai Zhe
Qin, Hongyi
Kim, Yeongseok
Lee, Sehan
Kim, Taesung
Yeom, Geun Young
Journal title: Nanotechnology
Article type: paper
Article title: Controlled MoS2 layer etching using CF4 plasma
Copyright information: © 2015 IOP Publishing Ltd
Publication dates
Date received: 2015-04-08
Date accepted: 2015-07-01
Online publication date: 2015-08-12