Funding for this research was provided by:
National Key R&D Program of China (2017YFA0206003)
Journal title: Journal of Micromechanics and Microengineering
Article type: paper
Article title: Optimization of photoresist development and DRIE processes to fabricate high aspect ratio Si structure in 5 nm scale
Copyright information: © 2019 IOP Publishing Ltd
Publication dates
Date received: 2018-09-24
Date accepted: 2018-12-14
Online publication date: 2019-01-21