Horstmann, Benjamin https://orcid.org/0000-0002-8525-221X
Pate, David https://orcid.org/0000-0002-1497-651X
Smith, Bennett https://orcid.org/0009-0006-8509-2611
Mamun, Md Ataul https://orcid.org/0000-0003-2122-7709
Atkinson, Gary
Özgür, Ümit https://orcid.org/0009-0000-2419-6376
Avrutin, Vitaliy https://orcid.org/0000-0002-3682-5384
Funding for this research was provided by:
Electric Power Research Institute
Virginia Microelectronics Center
Virginia Commonwealth University
Article Title: Cryogenic DRIE processes for high-precision silicon etching in MEMS applications
Journal Title: Journal of Micromechanics and Microengineering
Article Type: paper
Copyright Information: © 2024 The Author(s). Published by IOP Publishing Ltd
Publication dates
Date Received: 2024-02-10
Date Accepted: 2024-06-07
Online publication date: 2024-06-26