Shinoda, K
Miyoshi, N
Kobayashi, H
Miura, M
Kurihara, M
Maeda, K
Negishi, N
Sonoda, Y
Tanaka, M
Yasui, N
Izawa, M
Ishii, Y
Okuma, K
Saldana, T
Manos, J
Ishikawa, K
Hori, M
Journal title: Journal of Physics D: Applied Physics
Article type: paper
Article title: Selective atomic-level etching using two heating procedures, infrared irradiation and ion bombardment, for next-generation semiconductor device manufacturing
Copyright information: © 2017 IOP Publishing Ltd
Publication dates
Date received: 2016-12-27
Date accepted: 2017-03-22
Online publication date: 2017-04-13