Lopaev, D V
Rakhimova, T V
Rakhimov, A T
Zotovich, A I https://orcid.org/0000-0002-0811-6994
Zyryanov, S M https://orcid.org/0000-0003-1438-3631
Baklanov, M R
Funding for this research was provided by:
Russian Science Foundation (14-12-01012)
Article Title: Silicon dioxide and low- k material sputtering in dual frequency inductive discharge by argon ions with energies from 16 to 200 eV
Journal Title: Journal of Physics D: Applied Physics
Article Type: paper
Copyright Information: © 2017 IOP Publishing Ltd. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2017-10-10
Date Accepted: 2017-11-21
Online publication date: 2017-12-13