Yook, Yeong Geun
You, Hae Sung https://orcid.org/0000-0003-0694-6254
Park, Jae Hyeong
Chang, Won Seok
Kwon, Deuk Chul https://orcid.org/0000-0002-9358-9365
Yoon, Jung Sik
Yoon, Kook Hyun
Shin, Sung Sik
Yu, Dong Hun
Im, Yeon Ho https://orcid.org/0000-0002-0085-8213
Funding for this research was provided by:
Korean government
the Korean Institute of Energy Technology Evaluation and Planning
Korea Government
Article Title: Fast and realistic 3D feature profile simulation platform for plasma etching process
Journal Title: Journal of Physics D: Applied Physics
Article Type: paper
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Publication dates
Date Received: 2021-10-19
Date Accepted: 2022-02-25
Online publication date: 2022-03-30