Cui, Suihan
Chen, Qiuhao
Guo, Yuxiang
Chen, Lei
Jin, Zheng
Li, Xiteng
Yang, Chao
Wu, Zhongcan
Su, Xiongyu
Ma, Zhengyong
Fu, Ricky K Y
Tian, Xiubo
Chu, Paul K
Wu, Zhongzhen http://orcid.org/0000-0002-7484-8843
Funding for this research was provided by:
Shenzhen postdoctoral research fund project after outbound (2129933651)
City University of Hong Kong Strategic Research Grant (7005505)
Shenzhen - Hong Kong Research and Development Fund (SGDX20201103095406024)
Peking University Shenzhen Graduate School Research Start-up Fund of Introducing Talent (1270110273)
Shenzhen Science and Technology Research Grants (JSGG20191129112631389)
Guangdong - Hong Kong Technology Cooperation Funding Scheme (GHP/085/18SZ)
Article Title: High-precision modeling of dynamic etching in high-power magnetron sputtering
Journal Title: Journal of Physics D: Applied Physics
Article Type: paper
Copyright Information: © 2022 IOP Publishing Ltd
Publication dates
Date Received: 2021-12-30
Date Accepted: 2022-05-19
Online publication date: 2022-05-31