O’Donnell, S https://orcid.org/0000-0001-5194-0455
O’Neill, D
Shiel, K
Snelgrove, M https://orcid.org/0000-0003-0344-1146
Jose, F
McFeely, C
O’Connor, R https://orcid.org/0000-0001-5794-6188
Funding for this research was provided by:
Sustainable Energy Authority of Ireland (18/RDD/185)
Article Title: Plasma-enhanced atomic layer deposition of nickel and nickel oxide on silicon for photoelectrochemical applications
Journal Title: Journal of Physics D: Applied Physics
Article Type: paper
Copyright Information: © 2023 The Author(s). Published by IOP Publishing Ltd
Publication dates
Date Received: 2023-04-05
Date Accepted: 2023-06-23
Online publication date: 2023-07-13