Nomura, Toshimitsu https://orcid.org/0000-0003-3573-4744
Kakiuchi, Hiroaki https://orcid.org/0000-0003-4504-7219
Ohmi, Hiromasa https://orcid.org/0000-0001-6827-6052
Funding for this research was provided by:
Japan Society for the Promotion of Science
KAKENHI (16H04245)
Article Title: High-rate etching of silicon oxide and nitride using narrow-gap high-pressure (3.3 kPa) hydrogen plasma
Journal Title: Journal of Physics D: Applied Physics
Article Type: paper
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Publication dates
Date Received: 2023-11-25
Date Accepted: 2024-04-04
Online publication date: 2024-04-12