Xi, Zhaoying https://orcid.org/0009-0004-8734-3811
Liu, Zeng https://orcid.org/0000-0003-3215-7929
Fang, Junpeng
Bian, Ang https://orcid.org/0000-0001-7558-458X
Zhang, Shaohui https://orcid.org/0000-0002-0057-1167
Zhang, Jia-Han
Li, Lei
Guo, Yufeng https://orcid.org/0000-0002-1490-986X
Tang, Weihua
Funding for this research was provided by:
National Key Research and Development Program of China (2022YFB3605404)
National Natural Science Foundation of China (62204125)
Article Title: Etching of Ga2O3: an important process for device manufacturing
Journal Title: Journal of Physics D: Applied Physics
Article Type: paper
Copyright Information: © 2024 IOP Publishing Ltd. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2023-11-19
Date Accepted: 2024-09-04
Online publication date: 2024-09-12