Liu, Zhengjun
Shah, Ali
Alasaarela, Tapani
Chekurov, Nikolai
Savin, Hele
Tittonen, Ilkka
Funding for this research was provided by:
Suomen Akatemia (13140009)
Journal title: Nanotechnology
Article type: paper
Article title: Silicon dioxide mask by plasma enhanced atomic layer deposition in focused ion beam lithography
Copyright information: © 2017 IOP Publishing Ltd
Publication dates
Date received: 2016-09-18
Date accepted: 2017-01-03
Online publication date: 2017-01-20