Carbaugh, Daniel J
Pandya, Sneha G
Wright, Jason T
Kaya, Savas
Rahman, Faiz
Journal title: Nanotechnology
Article type: paper
Article title: Combination photo and electron beam lithography with polymethyl methacrylate (PMMA) resist
Copyright information: © 2017 IOP Publishing Ltd
Publication dates
Date received: 2017-06-14
Date accepted: 2017-09-12
Online publication date: 2017-10-16