Wu, Facai
Si, Shuyao
Shi, Tuo
Zhao, Xiaolong
Liu, Qi https://orcid.org/0000-0002-7947-7017
Liao, Lei
Lv, Hangbing
Long, Shibing
Liu, Ming
Funding for this research was provided by:
Beijing Training Project for the Leading Talents in S&T (ljrc201508)
Opening Project of Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics, the Chinese Academy of Sciences (Y7YS063005)
National High Technology Research Development Program (2014AA032900, 2016YFA0201803, 2016YFA0202304, 2017YFB0405603, 2017YFB0701703)
National Natural Science Foundation of China (61334007, 61404164, 61422407, 61474136, 61521064, 61522408, 61574166, 61732020)
Journal title: Nanotechnology
Article type: paper
Article title: Negative differential resistance effect induced by metal ion implantation in SiO2film for multilevel RRAM application
Copyright information: © 2018 IOP Publishing Ltd
Publication dates
Date received: 2017-10-27
Date accepted: 2017-12-08
Online publication date: 2018-01-05