Zou, Xiao https://orcid.org/0000-0003-2147-9244
Xu, Jingping
Huang, Hao
Zhu, Ziqang
Wang, Hongjiu
Li, Borui
Liao, Lei
Fang, Guojia https://orcid.org/0000-0002-3880-9943
Funding for this research was provided by:
National Natural Science Foundation of China (61774064 and 11674252)
Journal title: Nanotechnology
Article type: paper
Article title: A comparative study on top-gated and bottom-gated multilayer MoS2transistors with gate stacked dielectric of Al2O3/HfO2
Copyright information: © 2018 IOP Publishing Ltd
Publication dates
Date received: 2018-02-25
Date accepted: 2018-03-27
Online publication date: 2018-04-13