Journal title: Nanotechnology
Article type: paper
Article title: Modification of block copolymer lithography masks by O2/Ar plasma treatment: insights from lift-off experiments, nanopore etching and free membranes
Copyright information: © 2019 IOP Publishing Ltd
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Publication dates
Date received: 2018-11-15
Date accepted: 2019-02-13
Online publication date: 2019-03-20