Funding for this research was provided by:
NRF Korea
Article Title: EHD-jet patterned MoS2 on a high-k dielectric for high mobility in thin film transistor applications
Journal Title: Nanotechnology
Article Type: paper
Copyright Information: © 2021 IOP Publishing Ltd
Publication dates
Date Received: 2021-01-21
Date Accepted: 2021-03-09
Online publication date: 2021-03-25