Funding for this research was provided by:
NRF Korea
Article Title: EHD-jet patterned MoS 2 on a high- k dielectric for high mobility in thin film transistor applications
Journal Title: Nanotechnology
Article Type: paper
Copyright Information: © 2021 IOP Publishing Ltd. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2021-01-21
Date Accepted: 2021-03-09
Online publication date: 2021-03-25